Patent for High-Speed Nanoprinting Technology
University Distinguished and MIE William Lincoln Smith Professor Ahmed Busnaina was awarded a patent for “Fast fluidic assembly method for nanoscale and microscale printing.”
Abstract Source: USPTO
A scalable printing process capable of printing microscale and nanoscale features for additively manufacturing electronics is provided. This fast, directed assembly-based approach selectively prints microscale and nanoscale features on both rigid and flexible substrates. The printing speed is much faster than state-of-the-art inkjet and flexographic printing, and the resolution is two orders of magnitude higher, with minimum feature size of 100 nm. Feature patterns can be printed over large areas and require no special limitations on the assembled materials. Hydrophilic/hydrophobic patterns are used to direct deposition of nanomaterials to specific regions or to selectively assemble polymer blends to desired sites in a one-step process with high specificity and selectively. The selective deposition can be based on electrostatic forces, hydrogen bonding, or hydrophobic interactions. The methods and nanoscale patterned substrates can be used with polyelectrolytes, conductive polymers, colloids, and nanoparticles for application in electronics, sensors, energy, medical devices, and structural materials.
